DEPOSIÇÃO E CARACTERIZAÇÃO ELETROQUÍMICA DE FILMES FINOS DE TIN OBTIDOS POR GAIOLA CATÓDICA EM PLASMA H₂/N₂
DOI:
https://doi.org/10.56238/isevmjv4n5-015Palavras-chave:
Gaiola Catódica, TiN, Filmes Finos, Plasma, Impedância EletroquímicaResumo
Este trabalho investiga a deposição de filmes finos de nitreto de titânio (TiN) por descarga a plasma em gaiola catódica sobre substratos de vidro, em baixa temperatura (300 °C) e curta distância substrato–tampa (7 mm), com o objetivo de avaliar o efeito da relação H₂/N₂ do plasma nas propriedades dos filmes. As deposições foram realizadas a 1 Torr, e os filmes foram caracterizados por difração de raios X, reflectometria e espectroscopia de impedância eletroquímica (EIS). A análise por EIS possibilitou estimar a resistividade elétrica e a estabilidade química, evidenciando condições de deposição que favorecem maior resistência à corrosão. O diferencial deste estudo reside na combinação de: (i) geometria da gaiola catódica com elevado número de furos; (ii) curta distância substrato–tampa de 7 mm, que potencializa os efeitos de cátodo oco; e (iii) abordagem eletroquímica (EIS) para correlacionar processo, microestrutura e propriedades.
Referências
ANNUNZIATA, M.; OLIVA, A.; BASILE, M. A.; GIORDANO, M.; MAZZOLA, N.; RIZZO, A.; LANZA, A.; GUIDA, L. The effects of titanium nitride-coating on the topographic and biological features of TPS implant surfaces. Journal of Dentistry, v. 39, n. 11, p. 720-728, 2011. ISSN 0300-5712.
BARBOSA, M. G. C. et al. Surface modification of tool steel by cathodic cage TiN deposition. Surface Engineering, v. 37, n. 3, p. 334-342, 2021.
CAMERON, D. C. et al. Electrical properties of TiN thin films grown by ALD. ACS Applied Electronic Materials, v. 5, n. 7, p. 3056-3065, 2023. doi:10.1021/acsaelm.3c00379.
ÇAHA, I. et al. Corrosion and tribocorrosion behaviour of titanium nitride thin films grown on titanium under different deposition times. Surface and Coatings Technology, v. 374, p. 878-888, 2019. doi: 10.1016/j.surfcoat.2019.06.073.
CUNHA, L. T. et al. The role of composition, morphology and crystalline structure in the electrochemical behaviour of TiNx thin films for dry electrode sensor materials. Electrochimica Acta, v. 55, n. 1, p. 59-67, 2009. ISSN 0013-4686.
DAUDT, F. N. et al. TiN thin film deposition by cathodic cage discharge: effect of cage configuration and active species. Journal of Physics: Conference Series, v. 406, 12th High-Tech Plasma Processes Conference, 2012. ISSN 1742-6588.
DE ABREU, L. H. P. et al. The effect of cathodic cage plasma TiN deposition on surface properties of conventional plasma nitrided AISI-M2 steel. Metals, v. 12, n. 6, art. 961, 2022. doi:10.3390/met12060961.
JÍRŮ, J. et al. The use of electrochemical methods to determine the effect of nitrides of alloying elements on the electrochemical properties of titanium β-alloys. International Journal of Molecular Sciences, v. 24, n. 2, art. 1656, 2023. doi:10.3390/ijms24021656.
MADUREIRA, H. P. et al. Study of the optoelectronic properties of titanium nitride thin films deposited on glass by reactive sputtering in the cathodic cage. Materials Research, v. 26, e20230187, 2023. doi:10.1590/1980-5373-MR-2023-0187.
MASSIANI, Y. et al. Electrochemical study of titanium nitride films obtained by reactive sputtering. Thin Solid Films, v. 191, p. 305-306, 1990.
NOBRE, M. A. L.; LANFREDI, S. Dielectric spectroscopy on Bi₃Zn₂Sb₃O₁₄ ceramic: an approach based on the complex impedance. Journal of Physics and Chemistry of Solids, v. 64, p. 2457-2464, 2003. ISSN 0022-3697.
ROQUINY, Ph.; BODART, F.; TERWAGNE, G. Color control of titanium nitride coatings produced by reactive magnetron sputtering at temperature less than 100 °C. Surface and Coatings Technology, v. 116-119, p. 278-283, 1999.
SAMPAIO, W. R. V. et al. Influence of using different titanium cathodic cage plasma deposition configurations on the mechanical, tribological, and corrosion properties of AISI 304 stainless steel. Surface and Coatings Technology, v. 475, art. 130149, 2023. doi:10.1016/j.surfcoat.2023.130149.
SHAMSUDDIN, M. et al. Titanium nitride (TiN) as a promising alternative to plasmonic metals: a comprehensive review of synthesis and applications. Materials Advances, v. 5, n. 2, p. 457-476, 2024. doi:10.1039/D3MA01034J.
TAMAKI, M.; TOMII, Y.; YAMOTO, M. The role of hydrogen in plasma nitriding: hydrogen behavior in the titanium nitride layer. Plasma and Ions, v. 3, p. 33-39, 2000.
TARNIOWY, A.; MANIA, R.; REKAS, M. The effect of thermal treatment on the structure, optical and electrical properties of amorphous titanium nitride thin films. Thin Solid Films, v. 298, p. 221-225, 1997.
TJONG, S. C.; CHEN, H. Nanocrystalline materials and coatings. Materials Science and Engineering R: Reports, v. 45, p. 1-88, 2004. ISSN 0927-796X.
VASU, K.; KRISHNA, M. G.; PADMANABHAN, K. A. Conductive-atomic force microscopy study of local electron transport in nanostructured titanium nitride thin films. Thin Solid Films, v. 519, n. 22, p. 7702-7706, 2011.
WANG, C. et al. Resistivity of 30 nm thick TiN films deposited on various 10 nm thick interfacial layers. Journal of Vacuum Science & Technology A, v. 37, n. 6, 2019. doi:10.1116/1.5122878.
YAZDANI, A.; SOLTANIEH, M.; AGHAJANI, H.; RASTEGARI, S. A new method for deposition of nano sized titanium nitride on steels. Vacuum, v. 86, n. 2, p. 131-139, 2011.
YUSTE, M. et al. Improving the visible transmittance of low-e titanium nitride based coatings for solar thermal applications. Applied Surface Science, v. 258, n. 5, p. 1784-1788, 2011. ISSN 0169-4332.
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